The XLR 500i addresses critical dimension (CD) control and wafer yield. Advancements consists a 1.5x improvement in wavelength and bandwidth stability, and a 2x improvement in the dose stability. Moreover, chipmakers operating the new XLR 600iX at 60W will experience enhanced power optics lifetimes, resulting in a lower cost of operation compared to the XLR500i.
The launch of the XLR 600iX reinforces our commitment to support chipmakers with the latest technology and cost-effective solutions, said Ed Brown, president and chief operating officer of Cymer. As an integral part of chipmakers’ day-to-day operations, it is important to develop tools that will meet current and future lithography applications, without requiring additional future investment. Particularly in today’s environment, extendible tools such as the XLR 600iX are necessary to minimize costs and maximize capital investment value.
The new XLR 600iX light source will come equipped with the company’s Gas Lifetime eXtension (GLX) technology that reduces light source downtime during gas exchanges by a factor of 20, while improving CD uniformity. The platform will also provide company’s OnPulse LaserLife Program, guaranteeing year-over-year per pulse cost savings for life of light source, and stable, predictable running costs that scale with level of wafer production.
