The new EtchTemp SensorWafer allows etch engineers to additionally visualize, diagnose, and control their processes and process tools, through the drastically increased process measurement capabilities.
Enhancements incorporate:
Up to 7kW total radio frequency (RF) power and RF immunity for use in any reactor;
The ability to collect data without modification of process recipe or tool/robot settings;
Improved spatial resolution, with 32 sensors within 10mm of the wafer edge, and providing 60% increased radial coverage.
One of the key challenges for etch engineers today is matching chambers to achieve consistent performance across the entire toolset. Additionally, smaller processing windows make chamber matching difficult, and higher RF power recipes make it harder to achieve Cpk (process capability) goals, stated Larry Wagner, senior vice president and general manager SensArray division. With this new tool, etch engineers will have an accurate and reliable means for capturing critical etch process data, as well as the ability to characterize a full range of RF power and frequencies for all chambers currently on the market.
The new EtchTemp SensorWafer, supported by the PlasmaSuite Software package, is designed particularly for the chamber matching, post-PM qualification, trouble-shooting and process development. Important features for these applications incorporate advanced RF shielding, allowing precise temperature measurement at high RF powers and also all frequencies and reactor designs; 65 temperature sensors enabling increased wafer edge resolution; all electronics totally encased within silicon substrates, allowing thin 1.2mm profile resolves tool clearance issues; and superior manufacturing processes bringing improved reliability and durability.
With new EtchTemp’s highly accurate measurement of plasma etch temperatures; the engineers will have contact to earlier unavailable data, gaining information on dynamic response to diverse recipe steps and also chamber-to-chamber variations. The data captured by the new EtchTemp can also be utilized by equipment engineers to qualify tools and ensure chamber health.
The new EtchTemp is already in production use at three major etch original equipment manufacturer vendors, and also a Memory IDM company, with repeat orders being received from each of them.
